Share Email Print

Proceedings Paper

Liquid-phase silylation characterization of Shipley SPR500A-series resists using PRIME top-surface imaging process
Author(s): Khalil I. Arshak; Miroslav Mihov; Arousian Arshak; Declan McDonagh; David Sutton; Simon Newcomb; Thomas J. Kinsella
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Top Surface Imaging (TSI) is a well-established technique used to improve resolution for optical, ultraviolet and electron-beam lithography. The Positive Resist Image by Dry Etching (PRIME) is an advanced lithographic process incorporating electron beam exposure, near UV flood exposure, silylation and dry development. In this paper, the liquid-phase silylation process step in PRIME with Shipley SPR500A-series resists has been experimentally investigated as the most critical part of the process. FT-IR spectroscopy, UV spectroscopy, SIM spectrometry and cross-sectional SEM and TEM were used to characterise the silylation process. Electron-beam exposure with dose in the range of 25-100μC/cm2 at 30KeV was used to crosslinks the resist. Results show that an e-beam dose of 50µC/cm2 was sufficient to prevent silylation in the crosslinked areas. Two bifunctional silylating agents, the cyclic Hexamethylcyclotrisilazane (HMCTS) and the linear Bis[Dimethylamino] dimethylsilane (B[DMA]DMS), were examined and found that they silylate SPR505A much more efficiently than the previously reported Hexamethylcyclotrisiloxane (HMCTSx). The silylation contrast of the PRIME process using HMCTS silylating agent and SPR505A resist was found to be 11:1. The obtained silylated profiles of 1mm lines/spaces gratings for Shipley SPR510A resist have almost vertical sidewalls resulting in very high contrast between the silylated and unsilylated parts of the resist.

Paper Details

Date Published: 27 August 2003
PDF: 8 pages
Proc. SPIE 4876, Opto-Ireland 2002: Optics and Photonics Technologies and Applications, (27 August 2003); doi: 10.1117/12.463645
Show Author Affiliations
Khalil I. Arshak, Univ. of Limerick (Ireland)
Miroslav Mihov, Univ. of Limerick (Ireland)
Arousian Arshak, Univ. of Limerick (Ireland)
Declan McDonagh, Integrated Devices Technology, Inc. (United States)
David Sutton, Univ. of Limerick (Ireland)
Simon Newcomb, Univ. of Limerick (Ireland)
Thomas J. Kinsella, Intel Ireland Ltd. (Ireland)

Published in SPIE Proceedings Vol. 4876:
Opto-Ireland 2002: Optics and Photonics Technologies and Applications
Vincent Toal; Norman Douglas McMillan; Gerard M. O'Connor; Eon O'Mongain; Austin F. Duke; John F. Donegan; James A. McLaughlin; Brian D. MacCraith; Werner J. Blau, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?