Share Email Print

Proceedings Paper

Fractional Fourier domain filtering applied to improve image quality in photolithography
Author(s): Yixiao Zhang; Jinglei Du; Jingguo Yang; Yangsu Zeng; Yongkang Guo; Zheng Cui; Jun Yao
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In this paper, we present a new method to improve the image quality and resolution of photolithography by filtering in fractional Fourier domain. Introducing a filter into fractional Fourier domain can not only increase the flexibility of the filtering operation, but also enhance the image quality and the depth of focus in photolithography. The corresponding simulation results are illustrated.

Paper Details

Date Published: 19 April 2002
PDF: 5 pages
Proc. SPIE 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, (19 April 2002); doi: 10.1117/12.462880
Show Author Affiliations
Yixiao Zhang, Sichuan Univ. (China)
Jinglei Du, Sichuan Univ. (China)
Jingguo Yang, Sichuan Univ. (China)
Yangsu Zeng, Sichuan Univ. (China)
Yongkang Guo, Sichuan Univ. (China)
Zheng Cui, Rutherford Appleton Lab. (United Kingdom)
Jun Yao, Univ. of Strathclyde (United Kingdom)

Published in SPIE Proceedings Vol. 4755:
Design, Test, Integration, and Packaging of MEMS/MOEMS 2002
Bernard Courtois; Jean Michel Karam; Karen W. Markus; Bernd Michel; Tamal Mukherjee; James A. Walker, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?