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Proceedings Paper

Stage tracking of a mask-scan EB mask writer test stand
Author(s): Shinsuke Nishimura; Soichiro Mitsui; Munehiro Ogasawara; Kiminobu Akeno; Mitsuko Shimizu; Hideo Kusakabe; Hirotsugu Wada; Kiyoshi Hattori; Shusuke Yoshitake; Naoharu Shimomura; Jun Takamatsu; Hitoshi Sunaoshi; Yuuji Fukudome; Toru Tojo; Seiichi Tsuchiya
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Paper Abstract

A stage tracking function has been developed for a mask-scan EB mask writer. Position error of EB mask on an EB-mask-stage induces position error of projection beam on the EB-mask and the position of a writing pattern. The position of the EB-mask is measured by a laser interferometer. The shift from the aimed position is fed back to a mask selection deflection and a main deflection. The velocity of EB-mask stage and specimen-stage is also fed back to the deflection. The deflection control unit for the stage tracking has been made and the tracking function confirmed from the test memory of the unit. Using the unit, scanning writing patterns have been obtained with step and repeat stage mode.

Paper Details

Date Published: 11 March 2002
PDF: 8 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458327
Show Author Affiliations
Shinsuke Nishimura, Toshiba Corp. (Japan)
Soichiro Mitsui, Toshiba Corp. (Japan)
Munehiro Ogasawara, Toshiba Corp. (Japan)
Kiminobu Akeno, Toshiba Corp. (Japan)
Mitsuko Shimizu, Toshiba Corp. (Japan)
Hideo Kusakabe, Toshiba Corp. (Japan)
Hirotsugu Wada, Toshiba Corp. (Japan)
Kiyoshi Hattori, Toshiba Corp. (Japan)
Shusuke Yoshitake, Toshiba Corp. (Japan)
Naoharu Shimomura, Toshiba Corp. (Japan)
Jun Takamatsu, Toshiba Corp. (Japan)
Hitoshi Sunaoshi, Toshiba Corp. (Japan)
Yuuji Fukudome, Toshiba Corp. (Japan)
Toru Tojo, Toshiba Corp. (Japan)
Seiichi Tsuchiya, Toshiba Machine Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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