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Proceedings Paper

Technologies for electron-beam reticle writing systems for 130-nm node and below
Author(s): Genya Matsuoka; Hidetoshi Satoh; Akira Fujii; Kazui Mizuno; Tetsuji Nakahara; Suyo Asai; Yasuhiro Kadowaki; Hajime Shimada; Hiroshi Touda; Ken Iizumi; Hiroyuki Takahashi; Kazuyoshi Oonuki; Toshikazu Kawahara; Katsuhiro Kawasaki; Koji Nagata
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Paper Abstract

A new advanced e-beam reticle writing system HL-950M has been developed to meet requirements for the production of 130 nm node reticles as well as the development of 100 nm node reticles. In order to improve the critical dimension (CD) accuracy and pattern positioning accuracy, several new technologies have been introduced. Fine address size is realized by a newly developed control electronics that enables the system to handle address unit of 2.5 nm, providing four times higher resolution than that of the previous systems. Reconstruction of sub-sub-field (SSF) pattern data has been developed so that the same pattern is exposed twice with reconstructed SSF pattern data sets with different SSF boundaries, realizing better stitching and positioning accuracy. High accuracy proximity effect correction has been developed with a new second order proximity effect calculation scheme, particularly promising better CD linearity. As main results of the system evaluation, the global CD accuracy of 9 nm and the global pattern positioning accuracy of 15 nm have been obtained. The overall performance of the HL-950M system has satisfied the specifications required for the 130 nm node reticle production and 100nm node reticle development.

Paper Details

Date Published: 11 March 2002
PDF: 11 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458323
Show Author Affiliations
Genya Matsuoka, Hitachi High-Technologies Corp. (Japan)
Hidetoshi Satoh, Hitachi High-Technologies Corp. (Japan)
Akira Fujii, Hitachi High-Technologies Corp. (Japan)
Kazui Mizuno, Hitachi High-Technologies Corp. (Japan)
Tetsuji Nakahara, Hitachi High-Technologies Corp. (Japan)
Suyo Asai, Hitachi High-Technologies Corp. (Japan)
Yasuhiro Kadowaki, Hitachi High-Technologies Corp. (Japan)
Hajime Shimada, Hitachi High-Technologies Corp. (Japan)
Hiroshi Touda, Hitachi High-Technologies Corp. (Japan)
Ken Iizumi, Hitachi High-Technologies Corp. (Japan)
Hiroyuki Takahashi, Hitachi High-Technologies Corp. (Japan)
Kazuyoshi Oonuki, Hitachi High-Technologies Corp. (Japan)
Toshikazu Kawahara, Hitachi High-Technologies Corp. (Japan)
Katsuhiro Kawasaki, Hitachi High-Technologies Corp. (Japan)
Koji Nagata, Hitachi Central Research Lab. (Japan)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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