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Proceedings Paper

2001 update on the SEMI Standards Mask Qualification Terminology Task Force
Author(s): Rik M. Jonckheere
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Paper Abstract

At BACUS2000 this initiative towards a common use of terminology in photomask manufacturing and application, has been introduced. A proposed standard has been achieved for one-dimensional terminology, such as feature width uniformity, feature linearity, etc. The special approach of the document is that it includes a list of mandatory information to clarify a number given, e.g. as measurement result or as budget. The main target of the document is to serve as guideline for user-supplier communication in the field of photomasks. The present focus in the Task Force is on terminology for two-dimensional mask metrology. This includes corner rounding, line-end, shortening, edge roughness, etc. Such terms are already in use and described in literature, but a quantitative comparison is complicated without a full understanding of the technique and sample size used. In addition, the Task Force is discussing an approach by which the fidelity of a mask feature can be quantified. The challenge for use in benchmarking is to find a representative set of features. The suggested pattern fidelity quantification is a first step to allow an assessment of the printing performance of real reticles, taking limitations of the achieved pattern fidelity caused by the mask making process into account.

Paper Details

Date Published: 11 March 2002
PDF: 8 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458299
Show Author Affiliations
Rik M. Jonckheere, IMEC (Belgium)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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