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Proceedings Paper

Automation techniques for the handling of photomask data
Author(s): J. Gordon Hughes; Leslie Drennan
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Paper Abstract

This paper reviews four different strategies that can be used in the automated processing of photomask manufacturing data. The first of these is the automation of specific process steps such as the generation of Barcodes and Titling data, or specific software to perform format conversion, job deck generation or automated fracturing. The second strategy is the automation of complete flows that are specific to a customer or product type. This type of automation can be successfully built using the primitives developed by the first strategy. The third strategy is the automation of generic flow steps that are then applied to all customers. This is a much more powerful solution, but is significantly more demanding in the effort required for the design and implementation. The final strategy, the integration of automation over multiple complete supply chains is a desirable end game. The paper will report on the latest activities of the European Commission Fifth Framework project called Automatic Mask Order Processing System (AutoMOPS) that is developing a prototype implementation of a distributed server architecture that will allow automation and integration within the photomask manufacturing supply chain. The advantages and weaknesses of each of these techniques are reviewed using examples of automation which has been undertaken within Compugraphics over the previous decade. The interaction between these techniques is reviewed, as well as the evolution of solutions from each technique and the systems environment where these techniques are used.

Paper Details

Date Published: 11 March 2002
PDF: 12 pages
Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458292
Show Author Affiliations
J. Gordon Hughes, Compugraphics International Ltd. (United Kingdom)
Leslie Drennan, Compugraphics International Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 4562:
21st Annual BACUS Symposium on Photomask Technology
Giang T. Dao; Brian J. Grenon, Editor(s)

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