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Proceedings Paper

Precision machining of innovative materials using 157-nm excimer laser radiation
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Paper Abstract

The F2 excimer laser emitting at 157 nm have been developed to reliable industrial machines applicable for micro-fabrication. Fluorine lasers are available at various power ratings, with energies between 1 mJ and more than 50 mJ and repetition rates up to 2 kHz. The applications of the F2 lasers presented here are mainly related to the micro-machining of glasses, with a special focus on fused silica. Depending on the applied fluence, fused silica can be processed with 157 nm by material ablation as well as by modifying the optical properties, when the energy density is beyond the ablation threshold. Both techniques qualify the 157 nm for manufacturing optical elements like planar wave guides or grating structures. Furthermore, the wavelength has been tested for micro-fluidic and micro-mechanical structures.

Paper Details

Date Published: 25 February 2002
PDF: 4 pages
Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); doi: 10.1117/12.456905
Show Author Affiliations
Andreas Ostendorf, Laser Zentrum Hannover e.V. (Germany)
Uwe Stamm, Lambda Physik AG (Germany)
Thorsten Temme, Laser Zentrum Hannover e.V. (Germany)

Published in SPIE Proceedings Vol. 4426:
Second International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Yong Feng Lu; Koji Sugioka; Jan J. Dubowski, Editor(s)

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