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Proceedings Paper

High-resolution 157-nm imaging for lithography and micromachining applications
Author(s): Malcolm C. Gower; Julian S. Cashmore; Michael D. Whitfield; Philipp Gruenewald
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Paper Abstract

A Microstepper exposure tool for high-resolution imaging applications incorporating the F2 157nm laser is described. Details are presented of the optical architecture including beams shaping, homogenization and imaging objectives. Results from the high-resolution metrology, workpiece positioning and gas purging subsystems used in the tool are discussed. Use of the Microstepper for 70nm-node deep-iv lithography and submicron micromachining applications is presented.

Paper Details

Date Published: 25 February 2002
PDF: 7 pages
Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); doi: 10.1117/12.456887
Show Author Affiliations
Malcolm C. Gower, Exitech Ltd. (United Kingdom)
Julian S. Cashmore, Exitech Ltd. (United Kingdom)
Michael D. Whitfield, Exitech Ltd. (United Kingdom)
Philipp Gruenewald, Exitech Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 4426:
Second International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Yong Feng Lu; Koji Sugioka; Jan J. Dubowski, Editor(s)

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