TiNi shape memory alloy (SMA) thin films have been fabricated by pulsed-laser deposition (PLD) at different substrate temperatures. The stoichiometry, surface morphology and crystallinity of the films were characterized by X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM) and X-ray diffraction (XRD). The transformation behavior and crystallization temperatures were investigated by differential scanning calorimetry (DSC). It is found that the Ni content of the deposited films ranges from 46.7 to 52.09 at.%. The films deposited at low temperature are amorphous. The crystallization temperature of the Ti-51.5 at.% Ni thin film is 449 degree(s)C. The martensitic transformation temperature of the film is -20.8 degree(s)C.

Date Published: 25 February 2002
PDF: 4 pages
Proc. SPIE 4426, Second International Symposium on Laser Precision Microfabrication, (25 February 2002); doi: 10.1117/12.456841

Published in SPIE Proceedings Vol. 4426:
Second International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Yong Feng Lu; Koji Sugioka; Jan J. Dubowski, Editor(s)