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Proceedings Paper

Expert system for diagnosis/optimization of microlithography process*
Author(s): Dan V. Nicolau; Florin Fulga; Mircea V. Dusa
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Paper Abstract

The paper present the assumptions which were taken into consideration when building an Expert System for Microlithography (ExSyM), and describes this Expert System which has 'learning', 'teaching' and 'answering' functions.

Paper Details

Date Published: 1 March 1991
PDF: 7 pages
Proc. SPIE 1468, Applications of Artificial Intelligence IX, (1 March 1991); doi: 10.1117/12.45478
Show Author Affiliations
Dan V. Nicolau, ICCE (Australia)
Florin Fulga, ICCE (Romania) (Romania)
Mircea V. Dusa, SEEQ Technology, Inc. (United States)

Published in SPIE Proceedings Vol. 1468:
Applications of Artificial Intelligence IX
Mohan M. Trivedi, Editor(s)

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