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Proceedings Paper

Silicone polymers for optical films and devices
Author(s): Ann W. Norris; Jon DeGroot Jr.; Fumito Nishida; Udo Pernisz; Nobuo Kushibiki; Takuya Ogawa
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Paper Abstract

Silicones are among the most suitable materials for optical telecommunication devices due to their tolerance to high optical flux and their thermo-mechanical and environmental stability; they also have excellent processability. This work focuses on utilizing silicon-based branched resins and linear polymers for optical waveguides and switches where both refractive index and thermo-optic coefficient need to be controlled to the requirements of specific applications. Materials were synthesized with high optical transmission bands between 1.3 and 1.6 μm by varying the amount of aliphatic and aromatic C-H in the material. At the same time, the ratio of methyl to phenyl groups also controls the refractive index in the range of nD = 1.4 ... 1.6 precisely enough that both core and cladding components (Δn < 0.5%) can be obtained. Films of 5 to 20 μm thickness prepared on silicon substrates by spin-coating from solution were evaluated by measuring refractive index, thermo-optic coefficient, optical loss, and film uniformity both before and after exposure to high temperature and humidity. These films can be patterned through a number of techniques to form the required features. The resinous materials show very low birefringence and excellent resistance to heat and moisture.

Paper Details

Date Published: 18 December 2002
PDF: 8 pages
Proc. SPIE 4798, Linear and Nonlinear Optics of Organic Materials II, (18 December 2002); doi: 10.1117/12.452064
Show Author Affiliations
Ann W. Norris, Dow Corning Corp. (United States)
Jon DeGroot Jr., Dow Corning Corp. (United States)
Fumito Nishida, Dow Corning Corp. (United States)
Udo Pernisz, Dow Corning Corp. (United States)
Nobuo Kushibiki, Dow Corning Toray Silicone (Japan)
Takuya Ogawa, Dow Corning Toray Silicone (Japan)

Published in SPIE Proceedings Vol. 4798:
Linear and Nonlinear Optics of Organic Materials II
Manfred Eich; Mark G. Kuzyk, Editor(s)

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