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Proceedings Paper

Structure, thermal stability, and reflectivity of Sc/Si and Sc/W/Si/W multilayer x-ray mirrors
Author(s): Alexander V. Vinogradov; Yurii P. Pershin; Eugeniy Zubaryev; Dmitrii L. Voronov; Oleg Penkov; Valerii V. Kondratenko; Yurii A. Uspenskii; Igor A. Artioukov; John F. Seely
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Paper Abstract

Processes going on at elevated temperatures between Sc and Si layers in Sc/Si coatings are studied by X-ray scattering and cross-sectional transmission electron microscopy. It is shown that the W layers of 0.5-0.8 nm placed at Sc-Si interfaces form effective barriers preventing the penetration of Si into Sc. The effects of Si-Sc diffusion and W-barriers on the reflectivity of coatings are calculated in good agreement with experimental results. Presented measurements show that the Sc/W/Si/W multilayers with the period of 20.5 nm fabricated by dc-magnetron sputtering possess thermal stability up to 250 C and the normal incidence reflectivity of 24% at wavelengths about 40 nm.

Paper Details

Date Published: 12 December 2001
PDF: 6 pages
Proc. SPIE 4505, Soft X-Ray Lasers and Applications IV, (12 December 2001);
Show Author Affiliations
Alexander V. Vinogradov, P.N. Lebedev Physical Institute (Russia)
Yurii P. Pershin, Kharkov State Polytechnic Univ. (Ukraine)
Eugeniy Zubaryev, Kharkov State Polytechnic Univ. (Ukraine)
Dmitrii L. Voronov, Kharkov State Polytechnic Univ. (Ukraine)
Oleg Penkov, Kharkov State Polytechnic Univ. (Ukraine)
Valerii V. Kondratenko, Kharkov State Polytechnic Univ. (Ukraine)
Yurii A. Uspenskii, P.N. Lebedev Physical Institute (Russia)
Igor A. Artioukov, P.N. Lebedev Physical Institute (Russia)
John F. Seely, Naval Research Lab. (United States)

Published in SPIE Proceedings Vol. 4505:
Soft X-Ray Lasers and Applications IV
Ernst E. Fill; Jorge J. G. Rocca, Editor(s)

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