The planar microelectronics technology, involving lithography and highly anisotropic plasma etching techniques, allows manufacturing high quality refractive and diffractive lenses, which may be used in hard X-ray microprobe and microscopy applications. These silicon lenses are mechanically robust and can withstand high beat load of the white X-ray beam at third generation synchrotron radiation sources. For the first time we designed and manufactured a new type of lenses: kinoform lenses and parabolic lenses with scaled reduction of curvature radii. The theoretical background for such type of lens features is presented. Focusing properties in the terms of focus spot and efficiency of all these lenses were tested at the ESRF beamlines. Magnified imaging with planar lense was realized. Some future developments are discussed.

Date Published: 13 December 2001
PDF: 10 pages
Proc. SPIE 4499, X-Ray Micro- and Nano-Focusing: Applications and Techniques II, (13 December 2001); doi: 10.1117/12.450223

Published in SPIE Proceedings Vol. 4499:
X-Ray Micro- and Nano-Focusing: Applications and Techniques II
Ian McNulty, Editor(s)