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Proceedings Paper

Refractive and diffractive x-ray optical elements
Author(s): Irina Snigireva; Anatoly A. Snigirev; Serguei Kuznetsov; Christoph Rau; Timm Weitkamp; Leonid Shabelnikov; Michail Grigoriev; Vecheslav Yunkin; Martin Hoffmann; Edgar I. Voges
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Paper Abstract

The planar microelectronics technology, involving lithography and highly anisotropic plasma etching techniques, allows manufacturing high quality refractive and diffractive lenses, which may be used in hard X-ray microprobe and microscopy applications. These silicon lenses are mechanically robust and can withstand high beat load of the white X-ray beam at third generation synchrotron radiation sources. For the first time we designed and manufactured a new type of lenses: kinoform lenses and parabolic lenses with scaled reduction of curvature radii. The theoretical background for such type of lens features is presented. Focusing properties in the terms of focus spot and efficiency of all these lenses were tested at the ESRF beamlines. Magnified imaging with planar lense was realized. Some future developments are discussed.

Paper Details

Date Published: 13 December 2001
PDF: 10 pages
Proc. SPIE 4499, X-Ray Micro- and Nano-Focusing: Applications and Techniques II, (13 December 2001); doi: 10.1117/12.450223
Show Author Affiliations
Irina Snigireva, European Synchrotron Radiation Facility (France)
Anatoly A. Snigirev, European Synchrotron Radiation Facility (France)
Serguei Kuznetsov, European Synchrotron Radiation Facility (France)
Christoph Rau, European Synchrotron Radiation Facility (France)
Timm Weitkamp, European Synchrotron Radiation Facility (France)
Leonid Shabelnikov, Institute of Microelectronics Technology (Russia)
Michail Grigoriev, Institute of Microelectronics Technology (Russia)
Vecheslav Yunkin, Institute of Microelectronics Technology (Russia)
Martin Hoffmann, Univ. of Dortmund (Germany)
Edgar I. Voges, Univ. of Dortmund (Germany)

Published in SPIE Proceedings Vol. 4499:
X-Ray Micro- and Nano-Focusing: Applications and Techniques II
Ian McNulty, Editor(s)

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