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Proceedings Paper

Wide-field x-ray microscopy with Kirkpatrick-Baez optics
Author(s): Terrence Jach; Stephen M. Durbin; Alex Bakulin; David S. Bright; Cristian Stagarescu; George Srajer; Daniel Haskel; Joseph Pedulla
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Paper Abstract

Modern technology permits the fabrication of Kirkpatrick-Baez (KB) multilayer optics with performance close to the theoretical limit. We have constructed a KB field-imaging microscope which operates in the x-ray energy range 6-10 keV with a field of view of 40-150 micrometers . The optics perform at a reflectivity of 80% at the first Bragg peak. Using highly-collimated synchrotron radiation, we realize a resolution of 900 nm at 9 keV. The intensity and magnification are sufficient to perform real-time imaging with a CCD x-ray camera, with increases in field of view and resolution at this energy due to improvements in both data collection and image processing. The collimation of the incident radiation corresponds to Koehler illumination. The dynamic range of the images using a 12-bit camera allows us to extend the field of view at the Bragg reflection over several Kiessig fringes. We have adjusted the energy to take advantage of absorption at the excitation edges of elements and have performed imaging using circularly polarized radiation. We have used this instrument to demonstrate wide-field imaging in both absorption and diffraction. We present magnified images of multiple layers in a test integrated circuit in absorption and of a metal single crystal in diffraction.

Paper Details

Date Published: 13 December 2001
PDF: 7 pages
Proc. SPIE 4499, X-Ray Micro- and Nano-Focusing: Applications and Techniques II, (13 December 2001); doi: 10.1117/12.450220
Show Author Affiliations
Terrence Jach, National Institute of Standards and Technology (United States)
Stephen M. Durbin, Purdue Univ. (United States)
Alex Bakulin, Purdue Univ. (United States)
David S. Bright, National Institute of Standards and Technology (United States)
Cristian Stagarescu, Univ. of Chicago (United States)
George Srajer, Argonne National Lab. (United States)
Daniel Haskel, Argonne National Lab. (United States)
Joseph Pedulla, J. Pedulla Associates (United States)

Published in SPIE Proceedings Vol. 4499:
X-Ray Micro- and Nano-Focusing: Applications and Techniques II
Ian McNulty, Editor(s)

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