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Proceedings Paper

Selected performance parameters and functional principles of a new stepper generation
Author(s): Karl-Heinz Kliem; Volker Sczepanski; Uwe Michl; Reiner Hesse
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Paper Abstract

Modern wafer stepper generations are capable of realizing higher circuit levels due to high-performance lenses in the WV region, but at the same time there is also the necessity of designing assembly groups of the wafer stepper so that they meet the requirements of a wide assortment range in modem device fabrication. Long years of practical experience in the use of steppers enabled Jenoptik to implement an new generation of wafer steppers, in which particular value was placed on the instrumental improvement of the paramemters: - internal thermostatting/minimum particle contamination - alignment accuracy - useful depth of focus.

Paper Details

Date Published: 1 July 1991
PDF: 9 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44828
Show Author Affiliations
Karl-Heinz Kliem, Jenoptik JENA GmbH (Germany)
Volker Sczepanski, Jenoptik JENA GmbH (Germany)
Uwe Michl, Jenoptik JENA GmbH (Germany)
Reiner Hesse, Jenoptik JENA GmbH (Germany)

Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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