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Proceedings Paper

Effects of higher order aberrations on the process window
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Paper Abstract

High-quality imaging is essential for having the largest available process window for the various lithographic mask features, particularly those at the resolution limit of the lens. While lithographic lenses are designed to be 'diffraction limited,' shortcomings in the manufacturing process can introduce aberrations which affect imaging. The effects of such aberrations are explored via computer simulation, using exposure-defocus (E-D) diagrams and plots of linewidth versus focus for isolated and grouped lines. Data from a variety of lithographic lenses and the criteria for measuring lens performance are discussed.

Paper Details

Date Published: 1 July 1991
PDF: 14 pages
Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44796
Show Author Affiliations
Joseph E. Gortych, IBM/General Technology Div. (United States)
David M. Williamson, SVGL Lithography Systems, Inc. (United Kingdom)

Published in SPIE Proceedings Vol. 1463:
Optical/Laser Microlithography IV
Victor Pol, Editor(s)

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