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Proceedings Paper

Etch conditions of photolithographic holograms
Author(s): Yongkang Guo; Lurong Guo; Xiao-Chun Zhang
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Paper Abstract

The authors have, on combining holography with photolithography, improved the etching conditions of making binary elements and produced photolithographic holograms which can yield continuous phase modulation. This paper points out that it is most important to strictly control the selection ratio of etching rates, and gives the curves of the etching rates in respect to the flow of etching gas in the case of constant response power. A proper working point has been found. As the applications of the curves, high-quality optical elements can be made.

Paper Details

Date Published: 1 July 1991
PDF: 4 pages
Proc. SPIE 1461, Practical Holography V, (1 July 1991); doi: 10.1117/12.44717
Show Author Affiliations
Yongkang Guo, Sichuan Univ. (China)
Lurong Guo, Sichuan Univ. (China)
Xiao-Chun Zhang, Sichuan Univ. (China)

Published in SPIE Proceedings Vol. 1461:
Practical Holography V
Stephen A. Benton, Editor(s)

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