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Proceedings Paper

Mueller matrix measurements of small spherical particles deposited on c-Si wafer
Author(s): Bernard Kaplan; Bernard Drevillon
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Paper Abstract

Mueller matrix ellipsometry measurements are performed on accurately sizes polystyrene latex (PSL) and silicon oxide (SiO2) spherical particles deposited on a crystalline silicon surface. The mean particle diameter ranges from 0.2 μm to 1.5 μm. An argon laser beam (wavelength 515 nm) is impinging on the sample at a fixed near grazing incidence angle. The Mueller matrix of the diffuse light scattered by the particles is measured in the plane of incidence as a function of the scattering angle. Results are presented and compared with exact theory.

Paper Details

Date Published: 23 October 2001
PDF: 7 pages
Proc. SPIE 4447, Surface Scattering and Diffraction for Advanced Metrology, (23 October 2001); doi: 10.1117/12.446731
Show Author Affiliations
Bernard Kaplan, Ecole Polytechnique (France)
Bernard Drevillon, Ecole Polytechnique (France)

Published in SPIE Proceedings Vol. 4447:
Surface Scattering and Diffraction for Advanced Metrology
Zu-Han Gu; Alexei A. Maradudin, Editor(s)

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