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Proceedings Paper

Photoresist dissolution rates: a comparison of puddle, spray, and immersion processes
Author(s): Stewart A. Robertson; J. Tom M. Stevenson; Robert J. Holwill; Mark Thirsk; Ivan S. Daraktchiev; Steven G. Hansen
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Paper Abstract

Design and operation of an on-line Track Development Rate Monitor (TDRM) for track development systems are described. Dissolution data, measured using this equipment, for spray and puddle development processes is presented and compared to those derived from a conventional immersion DRM. Immersion data has traditionally been used to model all development. The validity of this is discussed. Also presented is an off-line technique for evaluating dissolution rates which utilize no specialized DRM equipment. The dissolution rates as measured by this technique are compared with those obtained from the TDRM/DRM methods. Simulations using all the calculated dissolution parameters are compared with SEM cross sections so that a practical evaluation of the various techniques can be made.

Paper Details

Date Published: 1 July 1991
PDF: 13 pages
Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1 July 1991);
Show Author Affiliations
Stewart A. Robertson, Univ. of Edinburgh (United States)
J. Tom M. Stevenson, Univ. of Edinburgh (United Kingdom)
Robert J. Holwill, Univ. of Edinburgh (United Kingdom)
Mark Thirsk, Olin Hunt Specialty Products NV (Belgium)
Ivan S. Daraktchiev, Olin Hunt Specialty Products NV (Belgium)
Steven G. Hansen, Olin Research Ctr. (United States)

Published in SPIE Proceedings Vol. 1464:
Integrated Circuit Metrology, Inspection, and Process Control V
William H. Arnold, Editor(s)

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