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Proceedings Paper

Parametric yield enhancement of a microresonator using statistical optimazation tools
Author(s): Flavien Delauche; Bachar Affour; Christian Dufaza
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Paper Abstract

High volume ICs production companies (telecom, etc) show a growing interest in MEMS components, especially RF and optical ones. Prototypes of integrated inductances and optical switches demonstrate very promising performances. The transition to the high volume production implies the development of Design For Manufacturability (DFM) tools featured to handle MEMS specific processes and related problems such as yield loss due to process dispersion. These tools must be part of a MEMS dedicated CAD environment. This paper presents results of what could be yield enhancement using usual statistical optimization tools and methods, and a new approach currently developed by MEMSCAP and LIRMM, based on response variability minimization.

Paper Details

Date Published: 2 October 2001
PDF: 10 pages
Proc. SPIE 4558, Reliability, Testing, and Characterization of MEMS/MOEMS, (2 October 2001); doi: 10.1117/12.443014
Show Author Affiliations
Flavien Delauche, MEMSCAP S.A. and CNRS (France)
Bachar Affour, MEMSCAP S.A. (France)
Christian Dufaza, CNRS (France)

Published in SPIE Proceedings Vol. 4558:
Reliability, Testing, and Characterization of MEMS/MOEMS
Rajeshuni Ramesham, Editor(s)

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