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Proceedings Paper

Machine for electrochemical etch stop
Author(s): Kun Zhou; Mujie Lan; Weiping Chen; Donghong Wang
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Paper Abstract

The configurations of electrochemical silicon etch-stop are discussed in this paper. An electrochemical etching machine with software and hardware, which can control the etching process of silicon very well, is designed and fabricated bas don the theory of electrochemical etching. Accurate etching temperature is obtained by modified integral algorithm of PID presented in temperature control in software. With an algorithm presented in control of etch-stop, the tech-stop point can be detected according to the characteristics of p- n junction current-time in electrochemical etching. The machine with hardware including S/H, controller and actuator can adapt to all wet etching configurations such as poly- electrode electrochemical etch-stop.

Paper Details

Date Published: 14 September 2001
PDF: 4 pages
Proc. SPIE 4414, International Conference on Sensor Technology (ISTC 2001), (14 September 2001); doi: 10.1117/12.440238
Show Author Affiliations
Kun Zhou, Harbin Institute of Technology (China)
Mujie Lan, Harbin Institute of Technology (China)
Weiping Chen, Harbin Institute of Technology (China)
Donghong Wang, Harbin Institute of Technology (China)

Published in SPIE Proceedings Vol. 4414:
International Conference on Sensor Technology (ISTC 2001)
Yikai Zhou; Shunqing Xu, Editor(s)

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