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Proceedings Paper

New strategic challenges for instrumentation in precision laser metrology for industry
Author(s): Matthias Chour; Jochen Mueller; Dietrich Hofmann
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Paper Abstract

A new dual frequency laser interferometric path measuring system is introduced that has been developed especially for the precision rapid-positioning systems of microlithographic large-scale instruments and for ultra-precision technology. The modulation frequency of 640 MHz, generated by a highly- stabilized He-Ne-laser allows, in combination with a novel HF signal processing method, measuring velocities up to 3.2 m/s without 'losing' even the least increment. It is a further metrological merit that the least increment is not generated by an additional LF interpolation - as in common - but arises from the parallel processing in the HF part. Practical examples for civil engineering, production integrated measurement, and quality control will be given.

Paper Details

Date Published: 11 September 2001
PDF: 8 pages
Proc. SPIE 4420, Laser Metrology for Precision Measurement and Inspection in Industry, (11 September 2001); doi: 10.1117/12.439199
Show Author Affiliations
Matthias Chour, Jenaer Messtechnik GmbH (Germany)
Jochen Mueller, Carl Zeiss Jena GmbH (Germany)
Dietrich Hofmann, STZ Q&Q Steinbeis Transferzentrum (Germany)

Published in SPIE Proceedings Vol. 4420:
Laser Metrology for Precision Measurement and Inspection in Industry
Armando Albertazzi Jr., Editor(s)

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