Influences of Environment for Pellicle: We irradiated ArF laser in the fluorine polymer membrane set into the atmosphere that mixed artificial air and organic vapor. We obtained the following finding: 1) Organic compounds in the environment had a harmful influence to pellicle. 2) the longevity of the pellicle depended on the kind of the organic compounds. 3) P-Xylene had as 300 times as harmful influence of IPA to pellicle. Influences of Mask Cases for quartz substrate: We set the quartz substrate into the various Mask cases and heated it for 40 degree(s)C, 3 days. After that we checked the change of the transmission rate, the sulfuric acid ion concentration, and ArF laser dosed area. We obtained the following findings: 1)All the Mask Case we investigated had harmful influence to quartz substrate *Transmission reduction of substrate *Haze generation by ArF laser exposure 2) Haze substance was ammonium sulfate or organic compound. By using heat treated cases, the above faultiness was reduced.

Date Published: 5 September 2001
PDF: 9 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438394

Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)