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Proceedings Paper

Development of refined cleaning technique focusing on an ecological viewpoint
Author(s): Koji Tange; Yoshikazu Nagamura; Kunihiro Hosono; Yuki Oomasa; Koichi Kido; Atsushi Hayashi; Yasutaka Kikuchi; Ichiro Imagawa; Yuichi Matsuzawa; Hozumi Usui
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Paper Abstract

In this paper, we focused on the refined cleaning process with minium use of chemicals. We developed a cleaning tools and process using high-concentration ozonic water generated by the high-efficiency ozonizing apparatus (OW00345, Mitsubishi Electric Corp. Industrial Systems), as chemicals substitution. To optimize a cleaning process, we have evaluated the removal and decomposition efficiency of organic compounds on the mask surface, the optical degradation of Cr and Siliside materials and so on.

Paper Details

Date Published: 5 September 2001
PDF: 12 pages
Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); doi: 10.1117/12.438375
Show Author Affiliations
Koji Tange, Mitsubishi Electric Corp. (Japan)
Yoshikazu Nagamura, Mitsubishi Electric Corp. (Japan)
Kunihiro Hosono, Mitsubishi Electric Corp. (Japan)
Yuki Oomasa, Toppan Printing Co., Ltd. (Japan)
Koichi Kido, Toppan Printing Co., Ltd. (Japan)
Atsushi Hayashi, Toppan Printing Co., Ltd. (Japan)
Yasutaka Kikuchi, Toppan Printing Co., Ltd. (Japan)
Ichiro Imagawa, Toppan Printing Co., Ltd. (Japan)
Yuichi Matsuzawa, Toppan Printing Co., Ltd. (Japan)
Hozumi Usui, WACOM Electric Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 4409:
Photomask and Next-Generation Lithography Mask Technology VIII
Hiroichi Kawahira, Editor(s)

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