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Proceedings Paper

Design and performance of photoresist materials for ArF lithography
Author(s): Hyun-Woo Kim; Dong-Won Jung; Sook Lee; Sang-Jun Choi; Sang-Gyun Woo; Robert J. Kavanagh; George G. Barclay; Robert F. Blacksmith; Doris Kang; Gerd Pohlers; James F. Cameron; Joe Mattia; Stefan Caporale; Thomas Penniman; Lori Anne Joesten; James W. Thackeray
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Paper Abstract

In this paper we review the design and performance of ArF resists developed from various polymer platforms. Inadequate etch performance of early ArF acrylate platforms necessitated the development of new etch resistant platforms, in terms of both etch rate and etch uniformity. Two resist platforms were developed to address etch resistance: 1) alternating copolymers of cyclic olefins and maleic anhydride (COMA); and 2) polycycloolefin polymers (CO). Improvements have been made in the imaging performance of these resists, such that they now approach the lithographic performance of acrylate based resists. Recently, a third platform based on polymerization of vinyl ethers with maleic anhydride (VEMA), which has excellent etch performance, was developed by Samsung. Here we will focus our discussion on acrylate, COMA and VEMA based resists.

Paper Details

Date Published: 24 August 2001
PDF: 8 pages
Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); doi: 10.1117/12.436908
Show Author Affiliations
Hyun-Woo Kim, Samsung Electronics Co., Ltd. (South Korea)
Dong-Won Jung, Samsung Electronics Co., Ltd. (South Korea)
Sook Lee, Samsung Electronics Co., Ltd. (South Korea)
Sang-Jun Choi, Samsung Electronics Co., Ltd. (South Korea)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (South Korea)
Robert J. Kavanagh, Shipley Co. Inc. (United States)
George G. Barclay, Shipley Co. Inc. (United States)
Robert F. Blacksmith, Shipley Co. Inc. (United States)
Doris Kang, Shipley Co. Inc. (United States)
Gerd Pohlers, Shipley Co. Inc. (United States)
James F. Cameron, Shipley Co. Inc. (United States)
Joe Mattia, Shipley Co. Inc. (United States)
Stefan Caporale, Shipley Co. Inc. (United States)
Thomas Penniman, Shipley Co. Inc. (United States)
Lori Anne Joesten, Shipley Co. Inc. (United States)
James W. Thackeray, Shipley Co. Inc. (United States)

Published in SPIE Proceedings Vol. 4345:
Advances in Resist Technology and Processing XVIII
Francis M. Houlihan, Editor(s)

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