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Proceedings Paper

Negative-tone cycloolefin photoresist for 193-nm lithography
Author(s): ShihChi Fu; Kuo-Huang Hsieh; Lon A. Wang
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Paper Abstract

The chemistry of acid-catalyzed dehydration reaction and followed by crosslinking of the tert-alcohol group in the cycloolefin photoresists was used to tailor the performance of the photoresists for 193nm lithography. A radiation- sensitive photoacid generator (PAG) in this chemically amplified photoresist (CAMP) can change the polarity of the exposed area of the resist and exhibit a negative-tone behavior. The cycloolefin resists are synthesized by the free radical copolymerization of alicyclic monomer and maleic anhydride, and/or by the cationic polymerization of alicyclic monomer via Pd catalyst followed by the attaching of tert-alcohol group in to the resist. The side reaction of cycloolefin copolymer was observed at the temperature below the post exposure baking (PEB) temperature, but this problem can be eliminated by the introduction of isobornyl methacrylate into the polymer. The lithographic performance of the resists was investigated by using isopropyl alcohol as a developer under various processing conditions. The results demonstrate that these resists are the promising candidates for being used in 193nm lithography.

Paper Details

Date Published: 24 August 2001
PDF: 10 pages
Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); doi: 10.1117/12.436906
Show Author Affiliations
ShihChi Fu, National Taiwan Univ. (Taiwan)
Kuo-Huang Hsieh, National Taiwan Univ. (Taiwan)
Lon A. Wang, National Taiwan Univ. (Taiwan)

Published in SPIE Proceedings Vol. 4345:
Advances in Resist Technology and Processing XVIII
Francis M. Houlihan, Editor(s)

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