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Proceedings Paper

Novel CA resists with photoacid generator in polymer chain
Author(s): Hengpeng Wu; Kenneth E. Gonsalves
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Paper Abstract

Novel chemically amplified resists with photoacid generating units in the polymer chains were synthesized and their lithographic properties evaluated under both 248nm and 20keV electron exposures. The positive-tone CA resists were found to exhibit excellent film formation behavior and extremely high sensitivity.

Paper Details

Date Published: 24 August 2001
PDF: 7 pages
Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); doi: 10.1117/12.436884
Show Author Affiliations
Hengpeng Wu, Univ. of Connecticut (United States)
Kenneth E. Gonsalves, Univ. of Connecticut (United States)

Published in SPIE Proceedings Vol. 4345:
Advances in Resist Technology and Processing XVIII
Francis M. Houlihan, Editor(s)

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