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Proceedings Paper

Spin coating properties of SU-8 thick-layer photoresist
Author(s): Ren-Haw Chen; Chao-Min Cheng
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Paper Abstract

In this paper the coating properties including film thickness, thickness uniformity and variation of viscosity of SU8 photoresist were investigated by using a spin coater and rheometer. Experimental results indicate that the coating qualities of SU8 are affected by several factors including the spinning speed, the photoresist viscosity, the initial acceleration and the duration. Some recommendations are presented for increasing the quality of SU8 spin coating in thick-film processing.

Paper Details

Date Published: 24 August 2001
PDF: 8 pages
Proc. SPIE 4345, Advances in Resist Technology and Processing XVIII, (24 August 2001); doi: 10.1117/12.436881
Show Author Affiliations
Ren-Haw Chen, National Chiao Tung Univ. (Taiwan)
Chao-Min Cheng, National Chiao Tung Univ. (Taiwan)

Published in SPIE Proceedings Vol. 4345:
Advances in Resist Technology and Processing XVIII
Francis M. Houlihan, Editor(s)

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