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Proceedings Paper

Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor
Author(s): Stephen Hsu; Xuelong Shi; Robert John Socha; J. Fung Chen; Jason C. Yee; Mohan Anath; Sunil Desai; Philip H. Imamura; Micheal J. Sherrill; Y. C. Tseng; H. A. Chang; J. F. Kao; Alex Tseng; WeiJyh Liu; Anseime Chen; Arthur Lin; Jan Pieter Kujten; Eric Jacobs; Arjan Verhappen
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Paper Abstract

This paper describes the design and implementation of a system for monitoring the performance of several major subsystems of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system and column stability by monitoring of the following subsystems and associated functional parameters. These include: 1) Vacuum system with pressure as a function of time being recorded for the electron-optical column (gun chamber), the specimen chamber, and the sample-loading unit. 2) The action of several components of the wafer handling system can be timed. 3) The electron gun emission currents and other signals to monitor the characteristics of the condenser and objective lenses may be used to correlate with image quality. 4) Image sharpness, electron beam current, signal-to-noise ratio, etc. can be evaluated.

Paper Details

Date Published: 22 August 2001
PDF: 14 pages
Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); doi: 10.1117/12.436806
Show Author Affiliations
Stephen Hsu, ASML MaskTools Inc. (United States)
Xuelong Shi, ASML MaskTools Inc. (United States)
Robert John Socha, ASML MaskTools Inc. (United States)
J. Fung Chen, ASML MaskTools Inc. (United States)
Jason C. Yee, KLA-Tencor Corp. (United States)
Mohan Anath, KLA-Tencor Corp. (United States)
Sunil Desai, KLA-Tencor Corp. (United States)
Philip H. Imamura, KLA-Tencor Corp. (United States)
Micheal J. Sherrill, KLA-Tencor Corp. (United States)
Y. C. Tseng, United Microelectronic Corp. (Taiwan)
H. A. Chang, United Microelectronic Corp. (Taiwan)
J. F. Kao, United Microelectronic Corp. (Taiwan)
Alex Tseng, United Microelectronic Corp. (Taiwan)
WeiJyh Liu, United Microelectronic Corp. (Taiwan)
Anseime Chen, United Microelectronic Corp. (Taiwan)
Arthur Lin, Grand Technology, Inc. (Taiwan)
Jan Pieter Kujten, ASML (Netherlands)
Eric Jacobs, ASML (Netherlands)
Arjan Verhappen, ASML (Netherlands)

Published in SPIE Proceedings Vol. 4344:
Metrology, Inspection, and Process Control for Microlithography XV
Neal T. Sullivan, Editor(s)

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