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Proceedings Paper

Progress of the EUVL alpha tool
Author(s): Hans Meiling; Jos P.H. Benschop; Udo Dinger; Peter Kuerz
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Paper Abstract

After the successful completion of the European program EUCLIDES in which core competence for Extreme UltraViolet Lithography (EUVL) technology was generated, ASML (system integration), Carl Zeiss (optics), and their partners have entered the next phase of the program: design and realization of an exposure tool called the alpha tool ((alpha) -tool). This tool should be completed in 2003, and will demonstrate 50-nm-node compliant imaging using full- field all-reflective four-times reducing optics, as well as high performance vacuum scanning wafer- and reticle stages. IN this paper we present the status of the project, as well as highlight the progress in the optics development and optics contamination mitigation efforts.

Paper Details

Date Published: 20 August 2001
PDF: 13 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436675
Show Author Affiliations
Hans Meiling, ASML B.V. (Netherlands)
Jos P.H. Benschop, ASML B.V. (Netherlands)
Udo Dinger, Carl Zeiss (Germany)
Peter Kuerz, Carl Zeiss (Germany)

Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

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