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Proceedings Paper

Progress on the realization of the electron column modules for SCALPEL high-throughput/alpha electron projection lithography tools
Author(s): Dirk Stenkamp; O. Kienzle; Alexander Orchowski; Wigbert D. Rau; A. Weickenmeier; G. Benner; M. Wetzke; Warren K. Waskiewicz; Victor Katsap; Xieqing Zhu; Haoning Liu; Eric Munro; John A. Rouse
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Paper Abstract

With the production of the first High-Throughput Alpha Tools, Electron Beam Projection Lithography (EPL) is entering the commercialization phase. Here, we report on the realization of the electron column modules for the SCALPEL HT/Alpha EPL systems, designed to demonstrate high wafer throughput at resolutions at and below 100 nm. We describe our highly modular setup of each electron optical component targeted at maximum flexibility and enabling a fast and smooth evolution towards higher throughput and resolution. By applying strict design and process rules we were able to set-up the complete production flow from the design, construction and manufacturing of the components of the ferrite/dielectric deflector based projection optics up to established qualification schemes within less than one year. A crucial point for the overall tool performance is the timely availability of system alignment and metrology strategies. Here we adapt state-of-the-art techniques from light optical lens manufacturing to a maximum amount. We discuss our metrology and alignment approach based on aerial image analysis combined with extensive electron optical imaging simulations and present first theoretical and experimental sub-100 nm results.

Paper Details

Date Published: 20 August 2001
PDF: 11 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436642
Show Author Affiliations
Dirk Stenkamp, Carl Zeiss Lithos GmbH (Germany)
O. Kienzle, Carl Zeiss Lithos GmbH (Germany)
Alexander Orchowski, Carl Zeiss Lithos GmbH (Germany)
Wigbert D. Rau, Carl Zeiss Lithos GmbH (Germany)
A. Weickenmeier, Carl Zeiss Lithos GmbH (Germany)
G. Benner, LEO Elektronenmikroskopie GmbH (Germany)
M. Wetzke, LEO Elektronenmikroskopie GmbH (Germany)
Warren K. Waskiewicz, Lucent Technologies/Bell Labs. (United States)
Victor Katsap, Lucent Technologies/Bell Labs. (United States)
Xieqing Zhu, Munro's Electron Beam Software Ltd. (United Kingdom)
Haoning Liu, Munro's Electron Beam Software Ltd. (United Kingdom)
Eric Munro, Munro's Electron Beam Software Ltd. (United Kingdom)
John A. Rouse, Munro's Electron Beam Software Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

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