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Proceedings Paper

Nikon EB Stepper: the latest development status
Author(s): Kazuaki Suzuki; Tomoharu Fujiwara; Kazunari Hada; Noriyuki Hirayanagi; Shintaro Kawata; Kenji Morita; Kazuya Okamoto; Teruaki Okino; Sumito Shimizu; Takehisa Yahiro; Hajime Yamamoto
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Paper Abstract

The latest development status of EB Stepper is reported. The experimental data include the latest resist image data exposed by 100keV electron beam, mask error factors and dosage margins at several backscattered electron levels, transmission data of continuous membrane reticles, and recommended structures for alignment marks, etc. The basic studies related to system design are also explained, those are the strategy for the management of reticle deformation and the stitching accuracy in overlaid layers, etc. Through these data, the resolution capability down to 50nm technology node is clearly shown and alignment/stitching capability is also described. The requirement to a continuous membrane reticle is indicated from experimental data.

Paper Details

Date Published: 20 August 2001
PDF: 8 pages
Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); doi: 10.1117/12.436632
Show Author Affiliations
Kazuaki Suzuki, Nikon Corp. (Japan)
Tomoharu Fujiwara, Nikon Corp. (Japan)
Kazunari Hada, Nikon Corp. (Japan)
Noriyuki Hirayanagi, Nikon Corp. (Japan)
Shintaro Kawata, Nikon Corp. (Japan)
Kenji Morita, Nikon Corp. (Japan)
Kazuya Okamoto, Nikon Corp. (Japan)
Teruaki Okino, Nikon Corp. (Japan)
Sumito Shimizu, Nikon Corp. (Japan)
Takehisa Yahiro, Nikon Corp. (Japan)
Hajime Yamamoto, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 4343:
Emerging Lithographic Technologies V
Elizabeth A. Dobisz, Editor(s)

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