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Proceedings Paper

Marathon evaluation of optical materials for 157-nm lithography
Author(s): Vladimir Liberman; Mordechai Rothschild; N. N. Efremow Jr.; Stephen T. Palmacci; Jan H. C. Sedlacek; Chris K. Van Peski; Kevin J. Orvek
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Paper Abstract

In this work we present progress on the long-term evaluation of optical materials for 157-nm lithographic applications. We review the unique metrology capabilities that have been developed for accurately assessing optical properties of samples both online and offline, utilizing VUV spectrophotometry with in-situ lamp-based cleaning. We review the current status of bulk materials for lenses, such as CaF2 and BaF2, and durability results of antireflectance coatings. Finally, we describe progress on materials testing of organic pellicles, both with 172-nm lamps as well as under 157-nm laser irradiation.

Paper Details

Date Published: 14 September 2001
PDF: 7 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435759
Show Author Affiliations
Vladimir Liberman, MIT Lincoln Lab. (United States)
Mordechai Rothschild, MIT Lincoln Lab. (United States)
N. N. Efremow Jr., MIT Lincoln Lab. (United States)
Stephen T. Palmacci, MIT Lincoln Lab. (United States)
Jan H. C. Sedlacek, MIT Lincoln Lab. (United States)
Chris K. Van Peski, International SEMATECH (United States)
Kevin J. Orvek, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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