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Proceedings Paper

Simplified models for edge transitions in rigorous mask modeling
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Paper Abstract

A new method is described for very accurate and rapid 3D simulation of alternating phase-shifting masks. This method for arbitrary 2D mask patterns is based on scalar imaging theory and is therefore much faster (200X or more) than rigorous 3D electromagnetic simulation. It is shown that an alternating phase-shifting mask can be decomposed into single openings and, subsequently, accurate scalar models for the single openings can be combined to give the complete mask result. The Fourier domain is found to be most suitable for the development of these accurate scalar models. A methodology for observing and modeling cross-talk between adjacent features in a phase-shift mask is introduced. The amount of cross-talk is found to be insignificant for mask technologies that are shallower than 90 degree(s)/270 degree(s).

Paper Details

Date Published: 14 September 2001
PDF: 14 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435733
Show Author Affiliations
Konstantinos Adam, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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