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Proceedings Paper

Experimental model verification of the thermal response of optical reticles
Author(s): Amr Y. Abdo; Phillip L. Reu; Michael P. Schlax; Roxann L. Engelstad; William A. Beckman; John W. Mitchell; Edward G. Lovell
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Paper Abstract

To extend optical lithography technology to the sub-100 nm linewidth regime, all mask-related distortions must be eliminated or minimized. Thermal distortion during the exposure process can be a significant contribution to the total pattern placement error budget for advanced photomasks. Consequently, several finite element (FE) models were developed to predict the thermal and the mechanical response of the optical reticle during exposure. This paper presents the experimental verification of the FE thermal models. In particular, the results of the numerical simulation were compared with the experimental data and excellent agreement was found.

Paper Details

Date Published: 14 September 2001
PDF: 6 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435687
Show Author Affiliations
Amr Y. Abdo, Univ. of Wisconsin/Madison (United States)
Phillip L. Reu, Univ. of Wisconsin/Madison (United States)
Michael P. Schlax, Univ. of Wisconsin/Madison (United States)
Roxann L. Engelstad, Univ. of Wisconsin/Madison (United States)
William A. Beckman, Univ. of Wisconsin/Madison (United States)
John W. Mitchell, Univ. of Wisconsin/Madison (United States)
Edward G. Lovell, Univ. of Wisconsin/Madison (United States)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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