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Proceedings Paper

157-nm Twyman-Green interferometer for lens testing
Author(s): Bryan D. Statt; Paul G. Dewa; Stephen K. Mack; Horst Schreiber; Bryan D. Stone; Paul Jay Tompkins
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Paper Abstract

Full acceptance of 157nm technology for next generation lithography requires that critical optical components and systems be characterized at this wavelength. Some of the challenges inherent in the 157nm test regime include purged beam paths, a partially coherent and astigmatic light source, limitations in reflective and transmissive optical components, and immature CCD detector technology. A Twyman-Green interferometer specially devised for testing lithographic objective lenses and systems at 157nm that addresses these challenges is presented. A description of the design and components used is provided along with test results obtained with the interferometer.

Paper Details

Date Published: 14 September 2001
PDF: 8 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435644
Show Author Affiliations
Bryan D. Statt, Tropel Corp. (United States)
Paul G. Dewa, Tropel Corp. (United States)
Stephen K. Mack, Tropel Corp. (United States)
Horst Schreiber, Tropel Corp. (United States)
Bryan D. Stone, Tropel Corp. (United States)
Paul Jay Tompkins, Tropel Corp. (United States)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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