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Proceedings Paper

Current status of Nikon's F2 exposure tool development
Author(s): Naomasa Shiraishi; Soichi Owa; Yasuhiro Ohmura; Takashi Aoki; Yukako Matsumoto; Masato Hatasawa; Takashi Mori; Issei Tanaka
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Paper Abstract

Current status of Nikon's F2 tool development is reported. At first, the required otpical performance of F2 tools will be discussed. Image simulation results show that the required NA for 70 nm is 0.8 or more. Then Nikon's approaches to realize the optics and tools are presented. For the F2 tools, the most important elements are the projection optics and gas purging of the light path. As for the projection optics, conventional lens type may not be applicable for F2 wavelength, and new type catadioptric optics may have to be developed. In this paper, designs of some catadioptric types and some all refractive types are shown and compared. AR-coatings are very important to obtain enough illumination power. New data on Nikon's AR-coatings are presented. For the gas purging, Nikon has already achieved oxygen concentration less than 1 ppm and further improvements are now in development. Results of gas purging are also presented.

Paper Details

Date Published: 14 September 2001
PDF: 8 pages
Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); doi: 10.1117/12.435631
Show Author Affiliations
Naomasa Shiraishi, Nikon Corp. (Japan)
Soichi Owa, Nikon Corp. (Japan)
Yasuhiro Ohmura, Nikon Corp. (Japan)
Takashi Aoki, Nikon Corp. (Japan)
Yukako Matsumoto, Nikon Corp. (Japan)
Masato Hatasawa, Nikon Corp. (Japan)
Takashi Mori, Nikon Corp. (Japan)
Issei Tanaka, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 4346:
Optical Microlithography XIV
Christopher J. Progler, Editor(s)

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