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Proceedings Paper

High-resolution 157-nm laser micromachining of polymers
Author(s): Philipp Gruenewald; Julian S. Cashmore; Jim Fieret; Malcolm C. Gower
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Paper Abstract

An Exitech Microstepper exposure tool has been used to laser micromachine a variety of polymeric materials with high resolution at a wavelength of 157 nm. We have demonstrated it is possible to machine thin film materials, different photoresists and fluorine-based polymers with submicron accuracy and resolution. The tool used for this work incorporated a 36x 0.5 NA Schwarzschild lens to project submicron resolution images of binary chrome-on-CaF2 masks onto free-standing and spun-on polymer films. The beam delivery system and the illuminator includes beam shaping and homogenization optics that allow fluences of greater than 1J/cm2 to be produced at the workpiece. Details of the optical system are presented together with process parameters and the results of the materials which have been machined.

Paper Details

Date Published: 29 June 2001
PDF: 10 pages
Proc. SPIE 4274, Laser Applications in Microelectronic and Optoelectronic Manufacturing VI, (29 June 2001); doi: 10.1117/12.432548
Show Author Affiliations
Philipp Gruenewald, Exitech Ltd. (United Kingdom)
Julian S. Cashmore, Exitech Ltd. (United Kingdom)
Jim Fieret, Exitech Ltd. (United Kingdom)
Malcolm C. Gower, Exitech Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 4274:
Laser Applications in Microelectronic and Optoelectronic Manufacturing VI
Malcolm C. Gower; Henry Helvajian; Koji Sugioka; Jan J. Dubowski, Editor(s)

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