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Proceedings Paper

Aberration control for 70-nm optical lithography
Author(s): Harry Sewell; James A. McClay; Andrew Guzman; Carlo Lafiandra
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Paper Abstract

This paper examines the control of optical aberrations in an advanced step-and-scan system operating at 157 nm wavelength that uses catadioptric projection optics. Optical lithography will need to operate at K-factors approaching 0.33 using 157 nm wavelength with extremely high numerical apertures.

Paper Details

Date Published: 26 April 2001
PDF: 11 pages
Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); doi: 10.1117/12.425216
Show Author Affiliations
Harry Sewell, SVG Lithography Systems, Inc. (United States)
James A. McClay, SVG Lithography Systems, Inc. (United States)
Andrew Guzman, SVG Lithography Systems, Inc. (United States)
Carlo Lafiandra, SVG Lithography Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 4404:
Lithography for Semiconductor Manufacturing II
Chris A. Mack; Tom Stevenson, Editor(s)

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