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Proceedings Paper

Quality assessment of advanced photomasks using the Q-CAP cluster tool
Author(s): Kai Peter; Thomas Schaetz; Volodymyr Ordynskyy; Roman Liebe; Martin Verbeek; Gerald Galan; Emanuele Baracchi; Corinne Miramond; Hans-Juergen Brueck; Gerd Scheuring; Thomas Engel; Yair Eran; Karl Sommer; Hans Hartmann
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Paper Abstract

The reduction of wavelength in optical lithography and the use of enhancement techniques like phase shift technology, optical proximity correction (OPC), or off-axis illumination, lead to new specifications for advanced photomasks: a challenge for cost effective mask qualification. `Q-CAP', the Qualification Cluster for Advanced Photomasks, comprising different inspection tools (a photomask defect inspection station, a CD metrology system, a photomask review station and a stepper simulation software tool) was developed to face these new requirements. This paper will show the performance and reliability of quality assessment using the Q-CAP cluster tool for inspection and qualification of photomasks. Special attention is paid to a key issue of mask qualification: the impact of CD deviations, loss of pattern fidelity-- especially for OPC pattern and mask defects on wafer level.

Paper Details

Date Published: 9 April 2001
PDF: 8 pages
Proc. SPIE 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (9 April 2001); doi: 10.1117/12.425084
Show Author Affiliations
Kai Peter, aiss GmbH (Germany)
Thomas Schaetz, Infineon Technologies AG (Germany)
Volodymyr Ordynskyy, aiss GmbH (Germany)
Roman Liebe, Infineon Technologies AG (Germany)
Martin Verbeek, Infineon Technologies AG (Germany)
Gerald Galan, DuPont Photomasks, Inc. (France)
Emanuele Baracchi, STMicroelectronics (Italy)
Corinne Miramond, STMicroelectronics (France)
Hans-Juergen Brueck, MueTec GmbH (Germany)
Gerd Scheuring, MueTec GmbH (Germany)
Thomas Engel, Carl Zeiss Jena GmbH (Germany)
Yair Eran, Applied Materials Israel Ltd. (Israel)
Karl Sommer, Karl Sommer Consulting (Germany)
Hans Hartmann, aiss GmbH (Germany)

Published in SPIE Proceedings Vol. 4349:
17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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