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Proceedings Paper

Functional damage thresholds of hafnia/silica coating designs for the NIF laser
Author(s): Jason Taniguchi; Nelson E. LeBarron; Jim Howe; Douglas J. Smith; Christopher J. Stolz; Carolyn L. Weinzapfel; James F. Kimmons
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Paper Abstract

Studies into the functional damage thresholds of hafnia/silica thin film coatings for the NIF laser have been conducted on two different-sized substrates: 50-mm-diam test substrates and full-sized (412 x 412 mm) NIF mirror substrates. For both studies, the optics were raster scanned by Q-switched Nd:YAG lasers emitting 1064-nm light with 10- ns pulse lengths. The coatings tested were primarily high reflectors, although polarizing beam splitter and anti- reflective thin films were tested on the small substrates. Tests were performed to find the functional damage threshold: the minimum fluence at which a damaged optic degrades the performance of the NIF laser, or, experimentally, the minimum fluence at which a damaged site begins to grow. Thus, the concern is with finding not only the fluence that caused a pit (for example) but also the fluence at which that pit begins to grow with subsequent laser shots. After a site begins a growth phase, the growth rate is measured as a function of fluence. This provides some information for predicting the optic lifetime for given operating limits of the laser.

Paper Details

Date Published: 12 April 2001
PDF: 9 pages
Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); doi: 10.1117/12.425071
Show Author Affiliations
Jason Taniguchi, Univ. of Rochester (United States)
Nelson E. LeBarron, Univ. of Rochester (United States)
Jim Howe, Univ. of Rochester (United States)
Douglas J. Smith, Univ. of Rochester (United States)
Christopher J. Stolz, Lawrence Livermore National Lab. (United States)
Carolyn L. Weinzapfel, Lawrence Livermore National Lab. (United States)
James F. Kimmons, Lawrence Livermore National Lab. (United States)

Published in SPIE Proceedings Vol. 4347:
Laser-Induced Damage in Optical Materials: 2000
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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