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Proceedings Paper

Quadratic increase of nonlinear absorption in thin Al2O3 films at 193 nm
Author(s): Oliver Apel; Klaus R. Mann; Gerd Marowsky
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Paper Abstract

Linear and nonlinear absorptance in Al2O3 films of different optical thicknesses are investigated using an ArF laser calorimeter. While the linear absorptance at 193 nm shows the linear increase expected for homogenous layers coated with identical process parameters, nonlinear absorptance increases nonlinearly with increasing film thickness. Thus, it cannot be described by a constant nonlinear absorption coefficient. The experimental findings are explained by a simple phenomenological approach using excited states with a finite interaction length longer than the actual film thickness. Due to the observed quadratical increase a new material constant is introduced which describes the nonlinear absorptance behavior correctly.

Paper Details

Date Published: 12 April 2001
PDF: 7 pages
Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); doi: 10.1117/12.425028
Show Author Affiliations
Oliver Apel, Laser-Lab. Goettingen eV (Germany)
Klaus R. Mann, Laser-Lab. Goettingen eV (Germany)
Gerd Marowsky, Laser-Lab. Goettingen eV (Germany)

Published in SPIE Proceedings Vol. 4347:
Laser-Induced Damage in Optical Materials: 2000
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; Keith L. Lewis; M. J. Soileau, Editor(s)

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