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Proceedings Paper

Sum-frequency generation of a cw single-frequency-mode coherent light at 252 nm for laser cooling of silicon
Author(s): Yuichi Asakawa; Hiroshi Kumagai; Katsumi Midorikawa; Minoru Obara
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Paper Abstract

We have developed a continuous-wave deep-ultraviolet single- mode coherent light source intended for laser cooling of silicon atoms, especially 28Si atom. It has a laser cooling transition between 3s 3P1 and 4s 3P0 whose corresponding wavelength is 252.4 nm and linewidth is 28.8 MHz, respectively. There has been no report on such a coherent light source, and therefore laser cooling of silicon atoms has never been achieved. To develop this coherent light source, we employed two-stage highly efficient frequency conversions by use of binary external cavities. In the first stage, the fundamental light was a 1.3-W, 746-nm Ti:sapphire laser and the second harmonic light was generated in a LBO crystal placed in a bow-tie ring cavity. Acquired 373-nm radiation power was 530 mW and the conversion efficiency was 40%. In the second stage, 50 mW of 252-nm light was obtained through sum frequency mixing in a BBO crystal placed in another bow-tie ring cavity between the 480-mW, 373-nm light from the first stage and the 380-mW, 780-nm light from the laser diode. By use of a piezotransducer and frequency modulation of laser diode, each radiation was enhanced in the same cavity for doubly resonant sum frequency mixing. These performance characteristics of this system should be enough to achieve laser cooling of silicon atoms.

Paper Details

Date Published: 3 May 2001
PDF: 8 pages
Proc. SPIE 4269, Laser Frequency Stabilization, Standards, Measurement, and Applications, (3 May 2001); doi: 10.1117/12.424470
Show Author Affiliations
Yuichi Asakawa, Keio Univ. (Japan)
Hiroshi Kumagai, RIKEN--Institute of Physical and Chemical Research (Japan)
Katsumi Midorikawa, RIKEN--Institute of Physical and Chemical Research (Japan)
Minoru Obara, Keio Univ. (Japan)

Published in SPIE Proceedings Vol. 4269:
Laser Frequency Stabilization, Standards, Measurement, and Applications
John L. Hall; Jun Ye, Editor(s)

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