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Proceedings Paper

Is it time to change mask magnification?
Author(s): Gilbert V. Shelden
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Paper Abstract

Last year's first reduction ration workshop ended in a consensus to maintain mask magnification at 4X, presentations at the meeting centered on when the mask industry could be ready for the lOOnm and 70nm lithography nodes as defined in the ITRS. The majority of the participants indicated by survey that they believed an increase in magnification from 4X to 5X or 6X is needed to pull the projected availability of photomasks in two years (2002) at the lOOnm node. Equivalently keeping the scan/field height a 22mm allows for 5X reticles to remain on 6" substrates. Some support was shown for 7" reticles but very little for 9" reticles based on the perceived difficulty to manufacture and high costs.

Paper Details

Date Published: 22 January 2001
PDF: 5 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410757
Show Author Affiliations
Gilbert V. Shelden, International SEMATECH (United States)

Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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