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Proceedings Paper

CARs blanks feasibility study results for advanced EB reticle fabrication
Author(s): Masahiro Hashimoto; Hideo Kobayashi; Yasunori Yokoya
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Paper Abstract

For advanced EB reticle fabrication, we have been studying chemically amplified resist (CAR) blanks feasibility as a mission of blanks supplier, since the mask-makers are likely to procure resist-coated blanks even with CARs for the future as they have been. In our study, we found several difficulties to utilize CARs for mask-making, such as CD movement due to delays in process, excess footing, CAR poor adhesion to chrome, spray-develop damage defects and so on. Then, we are working on solutions by joint-work with some resist makers, by new CARs development and process optimization. In addition, we did CARs performance comparison, by a practical 50keV-exposure tool, between a newly developed CAR and Tokyo Ohka Kogyo EP-009 as a benchmark, which was previously selected. This paper describes our findings how to use CARs for mask making as well as our comparative evaluation results between EP-009 and a newly developed CAR. 1. INTRODUCTION

Paper Details

Date Published: 22 January 2001
PDF: 17 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410738
Show Author Affiliations
Masahiro Hashimoto, HOYA Corp. (Japan)
Hideo Kobayashi, HOYA Corp. (Japan)
Yasunori Yokoya, HOYA Corp. (Japan)

Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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