Proceedings Paper
Improved throughput in 0.6-NA laser reticle writers| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
New writing strategies have been developed to meet the demand for high-volume mask manufacturing. The ALTA® 3000HT system enables users to meet their performance requirements at increased production capacity. The write time of an ALTA 3000HT mask writer has been observed to be substantially shorter than that of the ALTA 3000 system. The ability to change between eight and four averaging passes, as well as the addition of key hardware improvements, give users increased flexibility in meeting the throughput and print quality requirements for volume production mask manufacturing. Observed throughput and print performance data are presented.
Paper Details
Date Published: 22 January 2001
PDF: 12 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410724
Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)
PDF: 12 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410724
Show Author Affiliations
Gregory E. Valentin, Etec Systems, Inc., an Applied Materials Co. (United States)
Henry Chris Hamaker, Etec Systems, Inc., an Applied Materials Co. (United States)
Jay P. Daniel, Etec Systems, Inc., an Applied Materials Co. (United States)
Henry Chris Hamaker, Etec Systems, Inc., an Applied Materials Co. (United States)
Jay P. Daniel, Etec Systems, Inc., an Applied Materials Co. (United States)
Vishal Garg, DuPont Photomasks, Inc. (United States)
Daniel R. Sprenkel, DuPont Photomasks, Inc. (United States)
Daniel R. Sprenkel, DuPont Photomasks, Inc. (United States)
Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)
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