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Proceedings Paper

Using manufacturing rule check to prescreen reticle inspection databases
Author(s): Charles H. Howard; Paul DePesa; Curt J. Linder
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Paper Abstract

New reticle designs frequently contain mask features the inspection tools find objectionable. Typically these illegal features are handled in one of two ways. They are removed from the database with “do not inspect” regions, or the sensitivity is compromised to a level sufficient to reduce these nuisance defects to a tolerable level. Using the inspection machine to find these areas is both costly and inefficient. This paper presents a survey of the Manufacturing Rules Check option available from Transcription Enterprises to screen the database for these features before the reticle goes to inspection.

Paper Details

Date Published: 22 January 2001
PDF: 10 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410684
Show Author Affiliations
Charles H. Howard, DuPont Photomasks, Inc. (United States)
Paul DePesa, Transcription Enterprises, Inc. (United States)
Curt J. Linder, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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