The roadmap to develop smaller and smaller critical dimensions on photomasks has predicated the need for new technologies that can facilitate the repair on a scale that to date has proven difficult to achieve by conventional repai tools. RAVE has developed a novel technology that has application for subtractive repair of defects at and belo the 130 nm design rule.

Date Published: 22 January 2001
PDF: 4 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410683

Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)