Share Email Print

Proceedings Paper

Subtractive defect repair via nanomachining
Author(s): Mark R. Laurance
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The roadmap to develop smaller and smaller critical dimensions on photomasks has predicated the need for new technologies that can facilitate the repair on a scale that to date has proven difficult to achieve by conventional repai tools. RAVE has developed a novel technology that has application for subtractive repair of defects at and belo the 130 nm design rule.

Paper Details

Date Published: 22 January 2001
PDF: 4 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410683
Show Author Affiliations
Mark R. Laurance, RAVE LLC (United States)

Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?