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Proceedings Paper

Minimization of mask transmission asymmetry effect for chromeless phase-shift masks
Author(s): David Y. Chan; Justin W. Novak; Michael Fritze
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Paper Abstract

One of the issues with using strong phase-shift masks is the transmission asymmetry caused by diffraction effects due to 3D mask topography. The transmission is reduced through the etched portions of the mask and this can result in CD or pitch asymmetries in the printed image. A number of approaches have been suggested to minimize this effect including feature biasing, dual trench and undercut etching. In this work, we investigate the role the resist type can play in minimizing the effects of this aerial image asymmetry. We employ full electromagnetic simulations using PROMAX 2/D and PROLITH 2/D, AIMS simulation, and experiments using chrome-less phase-shift masks as a function of resist type. We conclude that the resist type can play a key role in minimizing the effects of aerial image asymmetry caused by mask topography effects thereby enabling simpler mask fabrication approaches.

Paper Details

Date Published: 22 January 2001
PDF: 10 pages
Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); doi: 10.1117/12.410678
Show Author Affiliations
David Y. Chan, Photronics, Inc. (United States)
Justin W. Novak, Photronics, Inc. (United States)
Michael Fritze, MIT Lincoln Lab. (United States)

Published in SPIE Proceedings Vol. 4186:
20th Annual BACUS Symposium on Photomask Technology
Brian J. Grenon; Giang T. Dao, Editor(s)

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