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Proceedings Paper

Stigmatic EUV spectroscopic system for emission and absorption studies of laser-produced plasmas
Author(s): Luca Poletto; Piergiorgio Nicolosi; Giuseppe Tondello
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Paper Abstract

The optical design of a stigmatic spectroscopic system for diagnostic of laser-produced plasmas in the 2.5 - 40 nm region is presented. The system consists of a grazing-incidence toroidal mirror which focuses the radiation emitted by a laser-produced plasma on the entrance slit of a spectrograph. The latter has a spherical variable-line-spaced grating with flat-field properties coupled to a spherical focusing mirror that compensates for the astigmatism. The mirror is crossed with respect to the grating, i.e. it is mounted with its tangential plane coincident with the equatorial plane of the grating. The spectrum is acquired by an EUV-enhanced CCD detector with high quantum efficiency. This stigmatic design has also spectral and spatial resolution capability for extended sources: the spectral resolution is independent from the size of the source while the spatial resolution decreases for sources far from the optical axis. The expected performances are presented and compared with those of a conventional stigmatic design with a plane variable-line- spaced grating.

Paper Details

Date Published: 18 December 2000
PDF: 11 pages
Proc. SPIE 4139, Instrumentation for UV/EUV Astronomy and Solar Missions, (18 December 2000); doi: 10.1117/12.410545
Show Author Affiliations
Luca Poletto, INFM/Univ. degli Studi di Padova (Italy)
Piergiorgio Nicolosi, INFM/Univ. degli Studi di Padova (Italy)
Giuseppe Tondello, INFM/Univ. degli Studi di Padova (Italy)

Published in SPIE Proceedings Vol. 4139:
Instrumentation for UV/EUV Astronomy and Solar Missions
Silvano Fineschi; Clarence M. Korendyke; Oswald H. W. Siegmund; Bruce E. Woodgate, Editor(s)

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